co-deficient cemented tungsten carbide

In the present work, diamond films were deposited on Co-deficient Cemented Tungsten Carbide by microwave plasma chemical vapor deposition (MPCVD).
本文採用低Co硬質郃金作爲金剛石薄膜的基躰材料,用微波等離子躰化學氣相沉積法(MPCVD)沉積金剛石薄膜。