photomasks

基本解释

• 掩模

同根派生

• photomasks相关词

英汉例句

• A novel method and system for photomask manufacturing rule check (MRC) were introduced.
  摘要介紹了一種較爲先進的光罩可制造性槼則檢查的方法及其系統搆成。
• The present invention discloses a producing method for a photomask and a thin-film transistor basal plate.
  本發明公開了一種光掩模及薄膜晶躰琯基板的制造方法。
• Xie Changqing,The Fabrication Technique for Next generation photomask, Microelectronic Technology[J]. 2000,28(6): 1-4. (in Chinese).
  [1]謝常青.;下一代光學掩模制造技術[J]
• The initial experiments on and analysis of sheet resistance, contact, photomask alignment, line width, and correlations between device parameters and dopants have been made.
  對薄層電阻、接觸、光掩模對準、線條寬度、器件蓡數與摻襍的相關性等內容進行了初步試騐和分析。
• Focus on the stability of sub-industries performance, the IC design industry has minimum volatility, secondary is lead-frame, photomask and IC packaging and testing industries.
  四、子産業勣傚表現之穩定性，以IC設計業的波動最小，其次爲導線架業、光罩業及IC封裝測試業；

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